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Welcome to the Passive Inflow Control Technology website!

The advent of inflow control technology has dramatically improved well productivity, resulting in increased recovery factors and associated benefits.

Production equalization through the use of Inflow Control Devices (ICD) has been shown to effectively improve drainage efficiency and wellbore cleanup.

Accurate predictions of inflow performance is an evolving science that relies on bridging completion and reservoir engineering technology, emphasizing modeling of the near wellbore to reservoir interface.

A critical factor in maximizing ICD benefit is accurate modeling to predict well performance, not only from the onset of production with near wellbore static modeling, but also over the lifetime of the reservoir through transient analysis specifically centered around the effect of ICDs.


PICT started as an idea from Eric Lauritzen who attended an ETF (www.expandableforum.com) meeting in 2007 and liked the set-up and deliverables of the ETF. Eric indicated that a similar industry force should be organized for inflow control technology, and thus PICT was born. PICT has initially been aimed at passive inflow control technology, however, it is understood that general inflow control would be a wider focus in subsequent meetings.

PICT¡¯s mission is to be the primary worldwide knowledge sharing forum for inflow control technology.

PICT¡¯s specific objectives are:

  • To increase awareness of inflow control technology and the business value of the technology throughout the industry
  • Establish an unbiased forum for exchange of technical information pertaining to (Passive) Inflow Control.
  • Identify contributing primary contacts within Operator and Service Companies (just networking)
  • Establish evaluation criteria and standards for application. Establish differentiators between Conventional, Passive, and Active technologies.
  • Identify challenges for successful technology adoption and deployment, and discuss methods and practices to facilitate the technology



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Next Meeting:
9th & 10th November 2010
Location: Penang, Malaysia


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